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Charge Quantity Influence on Resistance Switching Characteristic During Forming Process

Authors :
Kai-Hsang Chen
Kuan-Chang Chang
Ting-Chang Chang
Hao Wang
Yong-En Syu
Jung-Hui Chen
Yao-Feng Chang
Simon M. Sze
Hsing-Hua Wu
Jian-Yu Chen
Min-Chen Chen
Geng-Wei Chang
Ya-Hsiang Tai
Cong Ye
Jhih-Hong Pan
Tai-Fa Young
Tsung-Ming Tsai
J. C. Lou
Tian-Jian Chu
Source :
IEEE Electron Device Letters. 34:502-504
Publication Year :
2013
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2013.

Abstract

In this letter, we presented that the charge quantity is the critical factor for forming process. Forming is a pivotal process in resistance random access memory to activate the resistance switching behavior. However, overforming would lead to device damage. In general, the overshoot current has been considered as a degradation reason during the forming process. In this letter, the quantity of charge through the switching layer has been proven as the key element in the formation of the conduction path. Ultrafast pulse forming can form a discontinuous conduction path to reduce the operation power.

Details

ISSN :
15580563 and 07413106
Volume :
34
Database :
OpenAIRE
Journal :
IEEE Electron Device Letters
Accession number :
edsair.doi...........f7c04065fb867c19d607fe43a674c909
Full Text :
https://doi.org/10.1109/led.2013.2242843