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An Ultra-Low Gate Charge Shield Gate MOSFET with Pinch-Off Region and Schottky Contact

Authors :
Li Zhixuan
Wang Zhengkang
Ming Qiao
Bo Zhang
Wang Ruidi
Bai Wenyang
Source :
2020 IEEE 15th International Conference on Solid-State & Integrated Circuit Technology (ICSICT).
Publication Year :
2020
Publisher :
IEEE, 2020.

Abstract

A novel low gate charge $(\mathrm{Q}_{\mathrm{g}})$ vertical power MOSFET (VDMOS) based on high-doped pinch-off region and stepped trench shield gate is proposed in this work. The easy-depleted pinch-off region not only functions as a series depletion capacitance connected to the drift region, but also introduces lateral coupling effect with P-body and shield plate. Combination of the two leads to a great reduction in $\mathrm{C}_{\mathrm{gd}}$ . Besides, the metal plug of trench shield gate realizes an integrated Schottky contact without additional area, improving reverse recovery performance. Simulation and modeling are presented to evaluate the $\mathrm{C}_{\mathrm{gd}}$ shielding effect and reveal internal mechanism. Compared with conventional shield gate trench (SGT) device, $\mathrm{Q}_{\mathrm{gd}}$ and $\mathrm{Q}_{\mathrm{g}}$ are reduced by 65% and 59%, and $R_{on,sp}\cdot \mathrm{Q}_{\mathrm{g}}$ achieves a decrease of 53%.

Details

Database :
OpenAIRE
Journal :
2020 IEEE 15th International Conference on Solid-State & Integrated Circuit Technology (ICSICT)
Accession number :
edsair.doi...........f750ceb8c8fa56efed3276cfbc49653c