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X-Ray Photoelectron Spectroscopy Characterization of Aluminum Nitride Surface Oxides: Thermal and Hydrothermal Evolution
- Source :
- Journal of Electronic Materials. 36:414-419
- Publication Year :
- 2007
- Publisher :
- Springer Science and Business Media LLC, 2007.
-
Abstract
- Oxidized surfaces of aluminum nitride (AlN) epilayers grown on sapphire substrates and of AlN bulk crystals grown by physical vapor transport were studied by x-ray photoelectron spectroscopy (XPS). Analysis of the oxygen core level spectra showed approximately equal contributions from oxygen in two bonding states, which were identified by the binding energies and relative separation of the fitted peaks as OH− and O2−. The oxide on air-exposed AlN surfaces was identified as aluminum oxide hydroxide. Systematic annealing experiments were conducted in vacuum to study the thermal evolution of hydroxide layers, and a dehydration mechanism resulting in the formation of Al2O3 at high temperature was identified.
- Subjects :
- Aluminium oxides
Chemistry
Annealing (metallurgy)
Inorganic chemistry
Analytical chemistry
Oxide
Nitride
Condensed Matter Physics
Electronic, Optical and Magnetic Materials
chemistry.chemical_compound
X-ray photoelectron spectroscopy
Physical vapor deposition
Materials Chemistry
Sapphire
Hydroxide
Electrical and Electronic Engineering
Subjects
Details
- ISSN :
- 1543186X and 03615235
- Volume :
- 36
- Database :
- OpenAIRE
- Journal :
- Journal of Electronic Materials
- Accession number :
- edsair.doi...........f7448af1cd9cec6ff7d4dda7a52c6466