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Quantitative characterization of the mesoscopic surface roughness in a growing island film
- Source :
- Computational Materials Science. 33:369-374
- Publication Year :
- 2005
- Publisher :
- Elsevier BV, 2005.
-
Abstract
- A quantitative description of mesoscopic surface roughness generated in thin film growing via 3D island mechanism is presented. Analysis is based on the statistical model of a random nucleation and growth of hemispherical islands accounting for their collisions at late stages. Analytical expressions for a number of surface relief parameters: the rms roughness, the roughness coefficient, the surface height (depth) distribution and the package density factor providing a rather complete quantitative description of the evolving surface morphology during growth process in different condensation regimes are derived. It is shown that the surface height distribution is a non-Gaussian with a negative skewness and that the rms roughness and the roughness coefficient kinetics can be represented as a universal (independent of a condensation regime) unimodal function of either coverage or film thickness with a maximum just prior the completed film formation. The non-monotonic surface roughness dynamics in a growth process predicted by the model is consistent with experimental data.
- Subjects :
- Surface (mathematics)
Mesoscopic physics
General Computer Science
business.industry
Chemistry
Condensation
Nucleation
General Physics and Astronomy
Geometry
General Chemistry
Surface finish
Computational Mathematics
Optics
Mechanics of Materials
Skewness
Surface roughness
General Materials Science
Thin film
business
Subjects
Details
- ISSN :
- 09270256
- Volume :
- 33
- Database :
- OpenAIRE
- Journal :
- Computational Materials Science
- Accession number :
- edsair.doi...........f6addbb7a4046bb7851f45bbfbb3162f