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Remoldable Thiol–Ene Vitrimers for Photopatterning and Nanoimprint Lithography
- Source :
- Macromolecules. 49:8905-8913
- Publication Year :
- 2016
- Publisher :
- American Chemical Society (ACS), 2016.
-
Abstract
- Here, we introduce photocuring as a tool for the spatiotemporal control of vitrimer network synthesis via a photoinitiated thiol–ene polymerization. A difunctional norbornene monomer was synthesized containing ester linkages and pendant alcohol groups to participate in transesterification bond reshuffling reactions. The transesterification catalyst 1,5,7-triazabicyclo[4.4.0]dec-5-ene (TBD) was shown to be highly effective in promoting transesterification in these networks at high temperatures, without interfering with external spatiotemporal, photoinitiated control over the thiol–ene polymerization and associated network formation. A strong Arrhenius dependence of the stress relaxation time with inverse temperature was observed from 145 to 175 °C, which suggests a relaxation controlled by the transesterification reaction rate, similar to previously studied thermally cured vitrimers. These thiol–ene vitrimers are implemented in nanoimprint lithography (NIL) for creating surface features, where imprinting m...
- Subjects :
- Materials science
Polymers and Plastics
Organic Chemistry
02 engineering and technology
Transesterification
010402 general chemistry
021001 nanoscience & nanotechnology
Photochemistry
01 natural sciences
0104 chemical sciences
Catalysis
Nanoimprint lithography
law.invention
Inorganic Chemistry
chemistry.chemical_compound
Monomer
Vitrimers
chemistry
Polymerization
law
Polymer chemistry
Materials Chemistry
0210 nano-technology
Ene reaction
Norbornene
Subjects
Details
- ISSN :
- 15205835 and 00249297
- Volume :
- 49
- Database :
- OpenAIRE
- Journal :
- Macromolecules
- Accession number :
- edsair.doi...........f6487588462ffa6f20b5859ad24811ec
- Full Text :
- https://doi.org/10.1021/acs.macromol.6b01281