Back to Search Start Over

Remoldable Thiol–Ene Vitrimers for Photopatterning and Nanoimprint Lithography

Authors :
Austin Baranek
J. Taylor Goodrich
Gayla Berg Lyon
Christopher N. Bowman
Yifu Ding
Lewis M. Cox
Source :
Macromolecules. 49:8905-8913
Publication Year :
2016
Publisher :
American Chemical Society (ACS), 2016.

Abstract

Here, we introduce photocuring as a tool for the spatiotemporal control of vitrimer network synthesis via a photoinitiated thiol–ene polymerization. A difunctional norbornene monomer was synthesized containing ester linkages and pendant alcohol groups to participate in transesterification bond reshuffling reactions. The transesterification catalyst 1,5,7-triazabicyclo[4.4.0]dec-5-ene (TBD) was shown to be highly effective in promoting transesterification in these networks at high temperatures, without interfering with external spatiotemporal, photoinitiated control over the thiol–ene polymerization and associated network formation. A strong Arrhenius dependence of the stress relaxation time with inverse temperature was observed from 145 to 175 °C, which suggests a relaxation controlled by the transesterification reaction rate, similar to previously studied thermally cured vitrimers. These thiol–ene vitrimers are implemented in nanoimprint lithography (NIL) for creating surface features, where imprinting m...

Details

ISSN :
15205835 and 00249297
Volume :
49
Database :
OpenAIRE
Journal :
Macromolecules
Accession number :
edsair.doi...........f6487588462ffa6f20b5859ad24811ec
Full Text :
https://doi.org/10.1021/acs.macromol.6b01281