Monitoring the evolution of line edge roughness during resist development using an analog of quenched flow kinetics

MLA

Karen Petrillo, et al. “Monitoring the Evolution of Line Edge Roughness during Resist Development Using an Analog of Quenched Flow Kinetics.” SPIE Proceedings, Mar. 2013. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........f4a78590d89ec4a281707b44393b6431&authtype=sso&custid=ns315887.

APA

Karen Petrillo, Luisa D. Bozano, Martha I. Sanchez, Hoa D. Truong, Gregory M. Wallraff, Linda K. Sundberg, & William D. Hinsberg. (2013). Monitoring the evolution of line edge roughness during resist development using an analog of quenched flow kinetics. SPIE Proceedings.

Chicago

Karen Petrillo, Luisa D. Bozano, Martha I. Sanchez, Hoa D. Truong, Gregory M. Wallraff, Linda K. Sundberg, and William D. Hinsberg. 2013. “Monitoring the Evolution of Line Edge Roughness during Resist Development Using an Analog of Quenched Flow Kinetics.” SPIE Proceedings, March. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........f4a78590d89ec4a281707b44393b6431&authtype=sso&custid=ns315887.