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High Repetition Rate mJ-level Few-Cycle Pulse Laser Amplifier for XUV-FEL seeding

Authors :
Markus Drescher
M. Bakarezos
Rolf Follath
F. Obier
Brendan Dromey
Thomas Dzelzainis
J. Bahrdt
H. Schulte-Schrepping
Joerg Rossbach
Lutz Lilje
Nina Golubeva
Rolf Treusch
R. Mitzner
D. Adams
K. Rehlich
A. Leuschner
N. Baboi
Vladimir Balandin
A. Willner
Juliane Rönsch-Schulenburg
M. Tatarakis
E. Ploenjes
A. Meseck
W. Decking
S. Duesterer
M. Schulz
Markus Tischer
T. Limberg
M. Koerfer
Tim Laarmann
V. Miltchev
J. Spengler
Matthew Zepf
Christos Kamperidis
Valeri Ayvazyan
M. Schmitz
K. Holldack
R. Riedel
M. Gensch
Josef Feldhaus
Boris Schmidt
K. Tiedtke
M. Staack
A. K. Petrov
Siegfried Schreiber
Holger Schlarb
M. Yeung
H. J. Eckoldt
D. Noelle
B. Faatz
Franz Tavella
Nektarios A. Papadogiannis
Source :
Advances in Optical Materials.
Publication Year :
2011
Publisher :
OSA, 2011.

Abstract

Ultra-fast laser sources have revolutionized many fields in science. As technology improves, new applications can be made accessible. The OPCPA technique has shown potential to be the key technology for future amplifier systems, but hasn’t achieved a breakthrough such as Ti:Sapphire laser technology, mostly due to the complex pump amplifier design. We present an operationally stable OPCPA system that might turn the tide for OPCPA technology. This first prototype system will be used in the accelerator environment at the FLASH free electron laser at DESY in Hamburg. The envisioned key parameters for this amplifier are >1 mJ pulse energy with a repetition rate of 100 kHz and a pulse duration of

Details

Database :
OpenAIRE
Journal :
Advances in Optical Materials
Accession number :
edsair.doi...........f4709279cff076429ea6319fe0de18b3
Full Text :
https://doi.org/10.1364/hilas.2011.hthd1