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Direct Metal Nano-patterning Using Embossed Solid Electrolyte

Authors :
Anil Kumar
Kyle E. Jacobs
Placid M. Ferreira
Nicholas X. Fang
Keng Hsu
Source :
MRS Proceedings. 1156
Publication Year :
2009
Publisher :
Springer Science and Business Media LLC, 2009.

Abstract

The recent growth in optoelectronics, nanoelectronics, nanooptics, and chemical and biological sensing has been fueled by the ability to fabricate nanostructures with ever smaller features. However, several significant constraints still remain in terms of cost, limited pattern size, processing conditions, pattern flexibility, and so on. Fabrication of features as small as 50 nm at ambient conditions with high pattern flexibility and low cost remains a serious challenge. Here we report a new solid-state electrochemical imprinting process that is carried out at ambient conditions, requires nominal pressure and very low electric potential, eliminates any liquid electrolytes, shows very high reproducibility, and promises the capability to scale up for large area patterning while retaining a significant cost advantage. Through combination of the best merits of nanoimprint lithography, micro forming, and the solid-state electrochemical imprinting technique, S4, (recently introduced by Hsu et al., Nano Lett., 2007, 7, 446; and Schultz et al., J. Vac. Sci. Techol. B, 2007, 25, 2419), we show a very high pattern flexibility to create nano-scale metallic features.As a first step, we use a micro-forming-like embossing process to engrave nano-scale features onto a solid electrolyte tool surface using an e-beam fabricated Si mold. Silver sulfide, Ag2S, is used as a solid electrolyte because of its favorable mechanical properties for micro forming and its excellent electrochemical properties. This ionic compound is ductile and has a relatively low yield stress at 80MPa. Followed by embossing, the patterned solid electrolyte surface is then used to carry out the S4 process, creating a negative image on a metallic substrate. This process eliminates the costly Focused Ion Beam milling used by Hsu et al. to create features on the electrolyte tool. It is also highly favorable for large-area patterning as well as mass-production of metallic substrates restricted only by the capability to fabricate the mold at first step. The embossed solid-electrolyte tool surface can be easily trimmed off with a microtome; the tool can then be re-used for embossing and patterning metallic substrates.Using this process we demonstrate the ability to fabricate silver nanostructures with features 30 sq. mm. Such large scale fabrication is highly desired for applications like biomimetics and patterning for superhydrophobic surfaces.

Details

ISSN :
19464274 and 02729172
Volume :
1156
Database :
OpenAIRE
Journal :
MRS Proceedings
Accession number :
edsair.doi...........f2be89a8784670af0b54e3c91adad64f
Full Text :
https://doi.org/10.1557/proc-1156-d07-04