Cite
Demonstration of a 12 nm-half-pitch copper ultralow-k interconnect process
MLA
Christopher J. Jezewski, et al. “Demonstration of a 12 Nm-Half-Pitch Copper Ultralow-k Interconnect Process.” 2013 IEEE International Interconnect Technology Conference - IITC, June 2013. EBSCOhost, https://doi.org/10.1109/iitc.2013.6615593.
APA
Christopher J. Jezewski, Kanwal Jit Singh, Florian Gstrein, Robert B. Turkot, Richard E. Schenker, Rohan Akolkar, Jasmeet S. Chawla, Ramanan V. Chebiam, Hui Jae Yoo, M. Harmes, Gary Allen, James S. Clarke, Colin T. Carver, B. Krist, Hazel Lang, Tejaswi K. Indukuri, & Alan Myers. (2013). Demonstration of a 12 nm-half-pitch copper ultralow-k interconnect process. 2013 IEEE International Interconnect Technology Conference - IITC. https://doi.org/10.1109/iitc.2013.6615593
Chicago
Christopher J. Jezewski, Kanwal Jit Singh, Florian Gstrein, Robert B. Turkot, Richard E. Schenker, Rohan Akolkar, Jasmeet S. Chawla, et al. 2013. “Demonstration of a 12 Nm-Half-Pitch Copper Ultralow-k Interconnect Process.” 2013 IEEE International Interconnect Technology Conference - IITC, June. doi:10.1109/iitc.2013.6615593.