Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge

Authors :: Thomas Allen
Andres Cuevas
Source :: physica status solidi (RRL) - Rapid Research Letters. 9:220-224
Publication Year :: 2015
Publisher :: Wiley, 2015.
Abstract: This work has been supported by the Australian government through the Austra-lian Renewable Energy Agency (ARENA).

Subjects :: Work (thermodynamics)
Materials science
Silicon
Passivation
business.industry
chemistry.chemical_element
Charge (physics)
Nanotechnology
Plasma
Condensed Matter Physics
Atomic layer deposition
chemistry
Photovoltaics
Optoelectronics
General Materials Science
Crystalline silicon
business

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