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A TCAD-based Study of NDR Effect in NC-FinFET

Authors :
Xingsheng Wang
Chengxu Wang
Xiangshui Miao
Hao Yu
Source :
2020 IEEE International Conference on Integrated Circuits, Technologies and Applications (ICTA).
Publication Year :
2020
Publisher :
IEEE, 2020.

Abstract

In this paper, the cause of inverse drain induced barrier lowering effect in negative capacitance field effect transistors (NCFETs) is discussed, and a capacitance model is given. Based on inverse DIBL effect, negative differential resistance phenomenon could occur, and these two effects are hard to be removed. Since higher on-off ratio and lower NDR cannot be achieved at the same condition, their relationship with device structure is also studied.

Details

Database :
OpenAIRE
Journal :
2020 IEEE International Conference on Integrated Circuits, Technologies and Applications (ICTA)
Accession number :
edsair.doi...........f09fbc8729a5caa8dd3df96360f0ca6e
Full Text :
https://doi.org/10.1109/icta50426.2020.9332104