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A TCAD-based Study of NDR Effect in NC-FinFET
- Source :
- 2020 IEEE International Conference on Integrated Circuits, Technologies and Applications (ICTA).
- Publication Year :
- 2020
- Publisher :
- IEEE, 2020.
-
Abstract
- In this paper, the cause of inverse drain induced barrier lowering effect in negative capacitance field effect transistors (NCFETs) is discussed, and a capacitance model is given. Based on inverse DIBL effect, negative differential resistance phenomenon could occur, and these two effects are hard to be removed. Since higher on-off ratio and lower NDR cannot be achieved at the same condition, their relationship with device structure is also studied.
Details
- Database :
- OpenAIRE
- Journal :
- 2020 IEEE International Conference on Integrated Circuits, Technologies and Applications (ICTA)
- Accession number :
- edsair.doi...........f09fbc8729a5caa8dd3df96360f0ca6e
- Full Text :
- https://doi.org/10.1109/icta50426.2020.9332104