Calculation and simulation of intensity distribution of uniform-illumination optical systems for submicron photolithography

MLA

HanMin Yao, et al. “Calculation and Simulation of Intensity Distribution of Uniform-Illumination Optical Systems for Submicron Photolithography.” SPIE Proceedings, July 1997. EBSCOhost, https://doi.org/10.1117/12.276059.

APA

HanMin Yao, Dajian Lin, & Chongxi Zhou. (1997). Calculation and simulation of intensity distribution of uniform-illumination optical systems for submicron photolithography. SPIE Proceedings. https://doi.org/10.1117/12.276059

Chicago

HanMin Yao, Dajian Lin, and Chongxi Zhou. 1997. “Calculation and Simulation of Intensity Distribution of Uniform-Illumination Optical Systems for Submicron Photolithography.” SPIE Proceedings, July. doi:10.1117/12.276059.