Effects of deposition time and RF power on the film characteristics of magnetron sputtered silicon carbide thin films

MLA

M. R. Sanjay, et al. “Effects of Deposition Time and RF Power on the Film Characteristics of Magnetron Sputtered Silicon Carbide Thin Films.” Materials Today: Proceedings, vol. 52, Jan. 2022, pp. 2432–38. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........eeb24a73bf0d67142d106dbca574b62a&authtype=sso&custid=ns315887.

APA

M. R. Sanjay, L. Moloisane, S.S. Oladijo, Suchart Siengchin, L.L. Collieus, & Oluseyi Philip Oladijo. (2022). Effects of deposition time and RF power on the film characteristics of magnetron sputtered silicon carbide thin films. Materials Today: Proceedings, 52, 2432–2438.

Chicago

M. R. Sanjay, L. Moloisane, S.S. Oladijo, Suchart Siengchin, L.L. Collieus, and Oluseyi Philip Oladijo. 2022. “Effects of Deposition Time and RF Power on the Film Characteristics of Magnetron Sputtered Silicon Carbide Thin Films.” Materials Today: Proceedings 52 (January): 2432–38. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........eeb24a73bf0d67142d106dbca574b62a&authtype=sso&custid=ns315887.