Fabrication of single-electron tunneling devices

Authors :: Kyung Hwa Yoo
Jongseon Park
Jiman Choi
Jookeun Park
Source :: Proceedings of 20th Biennial Conference on Precision Electromagnetic Measurements.
Publication Year :: 2002
Publisher :: IEEE, 2002.
Abstract: We have fabricated very small Al/AlO/sub x//Al junctions connected in series using electron-beam lithography and double-angle evaporation techniques. The average junction area is obtained to be 150/spl times/150 nm/sup 2/.

Subjects :: Materials science
Fabrication
Silicon
business.industry
Scanning electron microscope
chemistry.chemical_element
Nanotechnology
Evaporation (deposition)
chemistry
Electrode
Optoelectronics
business
Lithography
Quantum tunnelling
Electron-beam lithography

Database :: OpenAIRE
Journal :: Proceedings of 20th Biennial Conference on Precision Electromagnetic Measurements
Accession number :: edsair.doi...........edaa3bc9f0ccaa307c4b92a02fd5b7fc
Full Text :: https://doi.org/10.1109/cpem.1996.547063