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Electron ballistic current enhancement of Ge1−xSnx FinFETs

Authors :
Huang-Siang Lan
Chee-Wee Liu
Source :
Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA).
Publication Year :
2014
Publisher :
IEEE, 2014.

Abstract

The indirect-direct transition of Ge 1−x Sn x at Sn content 6.5% is simulated by nonlocal empirical pseudopotential method. The non-parabolicity band of Γ valley is considered for confined mass, density of state, and conductivity mass for the electron ballistic current calculation of Ge 1−x Sn x FinFETs. The integration of alloying Sn content and applying external stress enhances the ballistic current due to carriers transferring from indirect L valleys with small injection velocity to direct Γ valley and other indirect L valleys with high injection velocity.

Details

Database :
OpenAIRE
Journal :
Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)
Accession number :
edsair.doi...........ed804ca011aae34ccd159a1b51b18cbf
Full Text :
https://doi.org/10.1109/vlsi-tsa.2014.6839656