Plasma parameters in pulsed laser-plasma deposition of thin films

In this paper the first results of an experimental study of the dependence of some plasma parameters (plasma density, degree of ionisation, energy distribution of the ions) on the laser parameters (light flux density, wavelength) for two laser types (TEA-CO 2 and excimer laser) are presented. A special experimental method has been developed for absolute measurement of some plasma parameters, such as plasma flux density, ion energy, multicharge ion content and ionization degree. The results obtained show the possibility to control the parameters of plasma fluxes over the deposition conditions and herewith to control the properties of the deposited films.