Tilted microlens fabrication method using two photoresists with different melting temperatures

A new fabrication method for a tilted microlens array for light control films was developed to increase the efficiency of a liquid crystal display so that lateral light sources are collected and the dazzling light problem at certain viewing angles is improved. The thermal reflow with two layers of different photoresists is used to fabricate the tilted microlens array in this study. After the lithography process, the round photoresist column with two layers of different photoresists can be obtained. During the thermal reflow processing, the upper photoresist layer (AZ-4620) reaches the glass transition temperature, which is transformed from a glassy state into a rubbery state. Since the glass transition temperature of the lower photoresist layer (AZ-5214E) is higher than the temperature of thermal reflow, the lower photoresist layer is still able to maintain its solid state. The lower layer creates a round base during the thermal reflow process. The experimental results show that the photoresist mold of tilted microlens may be produced under gravity by inverting and tilting the substrate during the thermal reflow process. After the wafer is placed inversely and obliquely, the base can not only restrict the bottom shape of the liquid photoresist to a round shape but also prevent the sliding of liquid photoresist during the thermal reflow process. Compared with the conventional thermal reflow without a base, the photoresist base is relatively reliable and effective in preventing lenses from sliding.