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Micro-Raman characterization of stress distribution within free standing mono- and poly-crystalline silicon membranes
- Source :
- Microelectronic Engineering. :469-472
- Publication Year :
- 1998
- Publisher :
- Elsevier BV, 1998.
-
Abstract
- Stress measurements were performed in a free standing monocrystalline cantilever and a polycrystalline silicon membrane suspended over a deep cavity, using micro-Raman spectroscopy. These micromechanical structures were fabricated using porous silicon as a sacrificial layer. The results show that the stress varies across the membrane and the cantilever, the level of stress in the latter being lower than in the membrane.
- Subjects :
- inorganic chemicals
Materials science
Cantilever
Silicon
technology, industry, and agriculture
Analytical chemistry
chemistry.chemical_element
engineering.material
equipment and supplies
Condensed Matter Physics
Porous silicon
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Monocrystalline silicon
Stress (mechanics)
Membrane
Polycrystalline silicon
chemistry
engineering
Electrical and Electronic Engineering
Composite material
Layer (electronics)
Subjects
Details
- ISSN :
- 01679317
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering
- Accession number :
- edsair.doi...........e81f88f225dd7bd5f13700cc5be4c64d
- Full Text :
- https://doi.org/10.1016/s0167-9317(98)00109-9