High-speed atmospheric atomic layer deposition of ultra thin amorphous TiO2 blocking layers at 100 °C for inverted bulk heterojunction solar cells

illtrafast, spatial atmosphe1ic atomic layer deposition, which does not involve vacuum steps and is compatible with roll-to-roll processing, is used to grow high quality Ti02 blocking layers for organic solar cells. Dense, uniform thin Ti02 films are grown at temperatures as low as 100 oc in only 37 s ( -20 nm/min growth rate). Incmporation of these films in P3HT-PCBM-based solar cells shows perfmmances comparable with cells made using Ti02 films deposited with much longer processing times and/or higher temperatures. Copyright © 2013 John Wiley & Sons, Ltd. Supporting information may be found in the online version of this article.