Back to Search Start Over

The effects of plating current and rotation speed on the microstructural properties of electrochemical plated Cu films

Authors :
Hsien-Chang Kuo
Hung-Ju Chien
Ming-Hsin Yeh
Shi-Jun Liu
Tzung-Hua Ying
Wei-Lin Wang
Source :
2016 5th International Symposium on Next-Generation Electronics (ISNE).
Publication Year :
2016
Publisher :
IEEE, 2016.

Abstract

The microstructures of electrochemical plated (ECP) Cu films are investigated by various plating current and the rotation speed of wafer. Decreasing plating current increases the impurity concentration in an ECP Cu film. The impurity content is also raised by elevating the rotation speed of wafer. The grain size and texture behavior of an ECP Cu film is affected by the impurity concentration and distribution.

Details

Database :
OpenAIRE
Journal :
2016 5th International Symposium on Next-Generation Electronics (ISNE)
Accession number :
edsair.doi...........e72a67520ee2b1f562576ec235037b31