Sulphur diffusion in copper: Small penetration curves

Sulphur diffusion in copper single crystals was studied at temperatures lower than 800°C for very short diffusion times. The distances of penetration were about 5 μm and a submicron sectioning technique was used. The curves obtained under these conditions do not follow a law of volume diffusion. These facts were interpreted by ascribing the role of diffusion short circuits to dislocations.