Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges

Authors :: Riccardo d'Agostino
Antonella Milella
Fabio Palumbo
Anna Maria Coclite
Francesco Fracassi
Source :: Plasma Processes and Polymers. 7:1022-1029
Publication Year :: 2010
Publisher :: Wiley, 2010.

Subjects :: Hexamethyldisiloxane
chemistry.chemical_compound
Materials science
Ethylene
Polymers and Plastics
chemistry
Plasma-enhanced chemical vapor deposition
Ft ir spectroscopy
Analytical chemistry
Low-k dielectric
Dielectric
Condensed Matter Physics
Characterization (materials science)

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