Vacuum control, and interlock system for VUV photochemistry beamline HESYRL

The paper describes the vacuum interlock system for the VUV photochemistry beamline. The interlock system is designed to limit the extent of damage in the vacuum failure of a beamline component. In particular it must protect the storage ring and other beamlines from the contamination, rising pressure, or catastrophic failure of one beamline. The principle and operation of the vacuum control and interlock system are presented.