Electroless Deposition of NiB on 15 Inch Glass Substrates for the Fabrication of Transistor Gates for Liquid Crystal Displays

MLA

Bruno Michel, et al. “Electroless Deposition of NiB on 15 Inch Glass Substrates for the Fabrication of Transistor Gates for Liquid Crystal Displays.” Langmuir, vol. 19, June 2003, pp. 5923–35. EBSCOhost, https://doi.org/10.1021/la0341714.

APA

Bruno Michel, Peter M. Fryer, Ronald W. Nunes, Emmanuel Delamarche, James Vichiconti, Heinz Schmid, Eugene J. O’Sullivan, W. Graham, Heiko Wolf, Paul A. Andry, John C. Flake, Matthias Geissler, & Robert L. Wisnieff. (2003). Electroless Deposition of NiB on 15 Inch Glass Substrates for the Fabrication of Transistor Gates for Liquid Crystal Displays. Langmuir, 19, 5923–5935. https://doi.org/10.1021/la0341714

Chicago

Bruno Michel, Peter M. Fryer, Ronald W. Nunes, Emmanuel Delamarche, James Vichiconti, Heinz Schmid, Eugene J. O’Sullivan, et al. 2003. “Electroless Deposition of NiB on 15 Inch Glass Substrates for the Fabrication of Transistor Gates for Liquid Crystal Displays.” Langmuir 19 (June): 5923–35. doi:10.1021/la0341714.