Abrasive particle trajectories and material removal non-uniformity during chemical mechanical polishing

MLA

Suryadevara V. Babu, and Vahid Rastegar. “Abrasive Particle Trajectories and Material Removal Non-Uniformity during Chemical Mechanical Polishing.” 2017 China Semiconductor Technology International Conference (CSTIC), Mar. 2017. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........e29297c5b899fc5fa1cf8f1fe461a668&authtype=sso&custid=ns315887.

APA

Suryadevara V. Babu, & Vahid Rastegar. (2017). Abrasive particle trajectories and material removal non-uniformity during chemical mechanical polishing. 2017 China Semiconductor Technology International Conference (CSTIC).

Chicago

Suryadevara V. Babu, and Vahid Rastegar. 2017. “Abrasive Particle Trajectories and Material Removal Non-Uniformity during Chemical Mechanical Polishing.” 2017 China Semiconductor Technology International Conference (CSTIC), March. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........e29297c5b899fc5fa1cf8f1fe461a668&authtype=sso&custid=ns315887.