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Erratum: 'Proximity gettering of C3H5 carbon cluster ion-implanted silicon wafers for CMOS image sensors: Gettering effects of transition metal, oxygen, and hydrogen impurities'
- Source :
- Japanese Journal of Applied Physics. 56:049201
- Publication Year :
- 2017
- Publisher :
- IOP Publishing, 2017.
Details
- ISSN :
- 13474065 and 00214922
- Volume :
- 56
- Database :
- OpenAIRE
- Journal :
- Japanese Journal of Applied Physics
- Accession number :
- edsair.doi...........e1ef3312ebd2daf765d42636da1d8424
- Full Text :
- https://doi.org/10.7567/jjap.56.049201