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Erratum: 'Proximity gettering of C3H5 carbon cluster ion-implanted silicon wafers for CMOS image sensors: Gettering effects of transition metal, oxygen, and hydrogen impurities'

Authors :
Kazunari Kurita
Takeshi Kadono
Ryousuke Okuyama
Ryo Hirose
Ayumi Onaka-Masada
Yoshihiro Koga
Hidehiko Okuda
Source :
Japanese Journal of Applied Physics. 56:049201
Publication Year :
2017
Publisher :
IOP Publishing, 2017.

Details

ISSN :
13474065 and 00214922
Volume :
56
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........e1ef3312ebd2daf765d42636da1d8424
Full Text :
https://doi.org/10.7567/jjap.56.049201