Cite
The thermal oxidation of silicon the special case of the growth of very thin films
MLA
C. Maillot, et al. “The Thermal Oxidation of Silicon the Special Case of the Growth of Very Thin Films.” Advances in Physics, vol. 35, Jan. 1986, pp. 237–74. EBSCOhost, https://doi.org/10.1080/00018738600101891.
APA
C. Maillot, C. d’Anterroches, François Rochet, M. Froment, H. Roulet, Georges Dufour, & S. Rigo. (1986). The thermal oxidation of silicon the special case of the growth of very thin films. Advances in Physics, 35, 237–274. https://doi.org/10.1080/00018738600101891
Chicago
C. Maillot, C. d’Anterroches, François Rochet, M. Froment, H. Roulet, Georges Dufour, and S. Rigo. 1986. “The Thermal Oxidation of Silicon the Special Case of the Growth of Very Thin Films.” Advances in Physics 35 (January): 237–74. doi:10.1080/00018738600101891.