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Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma

Authors :
Jaemin Song
Myeonggeon Lee
Sangwon Ryu
Yunchang Jang
Seolhye Park
Gon-Ho Kim
Source :
Current Applied Physics. 45:105-113
Publication Year :
2023
Publisher :
Elsevier BV, 2023.

Subjects

Subjects :
General Physics and Astronomy
General Materials Science

Details

ISSN :
15671739
Volume :
45
Database :
OpenAIRE
Journal :
Current Applied Physics
Accession number :
edsair.doi...........ddfbce51cee1e06d95a71e25444a0ce3

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