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A Study of Surface Resistance of Si(100)

Authors :
Shunsuke Tatsumi
Hiroki Kitagawa
S. Iida
Motonobu Yukawa
Source :
Japanese Journal of Applied Physics. 43:8248-8252
Publication Year :
2004
Publisher :
IOP Publishing, 2004.

Abstract

Although a Si(100) surface forms dimers to produce a stable structure, it contains defects such as steps which are thought to affect surface resistance. We measured the surface resistance of step-containing Si manufactured by an ordinary process, and discovered that Si exhibits angular characteristics (anisotropy). After performing measurements at 10° intervals over two revolutions of 360°, we found that the results are reproducible between the first and second turns, that the resistance is periodic with periods of 180° and 360°, and that the sheet resistances measured by the four-point-probe method are 7–13-fold greater than those calculated from the bulk resistance and thickness of the samples. Similar measurements were performed on step-free Si surfaces, which were found to exhibit almost no periodicity and had a sheet resistance is of 4–10-fold the bulk value. It was suggested that the periodicity of resistance is caused by the presence of many steps on the Si surface.

Details

ISSN :
13474065 and 00214922
Volume :
43
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........dd22326e231d39b355e8fa4819793cd0
Full Text :
https://doi.org/10.1143/jjap.43.8248