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Identification of Film-Forming Species during SiC-CVD of CH3SiCl3/H2 by Exploiting Deep Microtrenches

Authors :
Noboru Sato
Yuichi Funato
Yasuyuki Fukushima
Kohei Shima
Yukihiro Shimogaki
Takeshi Momose
Source :
ECS Journal of Solid State Science and Technology. 8:P423-P429
Publication Year :
2019
Publisher :
The Electrochemical Society, 2019.

Details

ISSN :
21628777 and 21628769
Volume :
8
Database :
OpenAIRE
Journal :
ECS Journal of Solid State Science and Technology
Accession number :
edsair.doi...........dd1adf9762bc5dcde562b5141b3dbfb9