Design correction in extreme ultraviolet lithography

MLA

Eric Hendrickx, et al. “Design Correction in Extreme Ultraviolet Lithography.” Journal of Micro/Nanolithography, MEMS, and MOEMS, vol. 9, Nov. 2010, p. 043001. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........dcfdd27cf7afd3545d320b9e8282cfc9&authtype=sso&custid=ns315887.

APA

Eric Hendrickx, Ardavan Niroomand, Germain Fenger, & Gian Lorusso. (2010). Design correction in extreme ultraviolet lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 9, 043001.

Chicago

Eric Hendrickx, Ardavan Niroomand, Germain Fenger, and Gian Lorusso. 2010. “Design Correction in Extreme Ultraviolet Lithography.” Journal of Micro/Nanolithography, MEMS, and MOEMS 9 (November): 043001. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........dcfdd27cf7afd3545d320b9e8282cfc9&authtype=sso&custid=ns315887.