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A Novel Lightly Doping Technique for LDD Structure MILC Poly-Si TFTs Using Gate Insulator as a Doping Mask and the Effect of the LDD Structure on the TFTs
- Source :
- ECS Meeting Abstracts. :69-69
- Publication Year :
- 2012
- Publisher :
- The Electrochemical Society, 2012.
-
Abstract
- not Available.
Details
- ISSN :
- 21512043
- Database :
- OpenAIRE
- Journal :
- ECS Meeting Abstracts
- Accession number :
- edsair.doi...........dad234878b25d8679f11993fa8632040
- Full Text :
- https://doi.org/10.1149/ma2012-01/2/69