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Electrical resistivity of SmB6 thin films prepared by pulsed laser deposition with various heat treatment
- Source :
- Physica B: Condensed Matter. 613:413021
- Publication Year :
- 2021
- Publisher :
- Elsevier BV, 2021.
-
Abstract
- Thin films of SmB 6 were prepared by PLD on several substrates kept at ambient temperature or at 600 ° C during the deposition. As shown, also post-deposition annealing at 600 ° C can be used to obtain good quality SmB 6 , but heating the substrate during deposition results in higher normalized resistance. The highest value R (2 K)/ R (300 K = 2.21 was achieved for the film deposited on a heated, polished ultra-low expansion glass ceramics substrate Clearceram®-Z. Electrical resistance measurements were performed at temperatures from 300 K down to 2 K. Numerical analysis showed that the resistivity can be described by a two-channel model with temperature activated and non-activated terms, while two energy scales were found. Activation energy W A = 3.7 − 4.8 meV, relevant in temperature interval 16 − 22 K, has been attributed to presence of a forbidden gap in SmB 6 and W D = 0.31 − 0.37 meV, which corresponds to the region 2 − 3.3 K is assumed to be a consequence of an impurity band in the forbidden gap.
- Subjects :
- 010302 applied physics
Materials science
Annealing (metallurgy)
Kondo insulator
Analytical chemistry
02 engineering and technology
Substrate (electronics)
021001 nanoscience & nanotechnology
Condensed Matter Physics
01 natural sciences
Electronic, Optical and Magnetic Materials
Pulsed laser deposition
Electrical resistance and conductance
Electrical resistivity and conductivity
0103 physical sciences
Deposition (phase transition)
Electrical and Electronic Engineering
Thin film
0210 nano-technology
Subjects
Details
- ISSN :
- 09214526
- Volume :
- 613
- Database :
- OpenAIRE
- Journal :
- Physica B: Condensed Matter
- Accession number :
- edsair.doi...........da997a525dd7306faee1c04ecb1c5310