Annealing Effect on Electronic Characteristics of HfSiON Films fabricated by Damascene Gate Process

Authors :: Kikuo Yamabe
Kouichi Murata
Tomohiro Hayashi
T C. Tamura
Motoyuki Sato
Akira Uedono
Kenji Shiraishi
Naoto Umezawa
Toyohiro Chikyow
Heiji Watanabe
Yasuo Nara
Yuzuru Ohji
S. Miyazaki
Keisaku Yamada
Ryu Hasunuma
Source :: ECS Meeting Abstracts. :1976-1976
Publication Year :: 2008
Publisher :: The Electrochemical Society, 2008.
Abstract: not Available.

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