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Pt-doped Ni-silicide films formed by pulsed-laser annealing: Microstructural evolution and thermally robust Ni1-xPtxSi2 formation
- Source :
- Journal of Alloys and Compounds. 788:1013-1020
- Publication Year :
- 2019
- Publisher :
- Elsevier BV, 2019.
-
Abstract
- Pulsed-laser annealing (PLA) was performed on a preformed Pt-doped Ni-rich silicide film (Ni2Si phase), and its microstructural and phase evolution were studied from submelting to melting condition by varying the laser power density (P). Vertically nonuniform compositional profile with an interfacial intermixing was observed under a solid state reaction regime (P
- Subjects :
- Laser power density
Pulsed laser
Microstructural evolution
Materials science
Annealing (metallurgy)
Mechanical Engineering
Doping
Metals and Alloys
Solid-state
02 engineering and technology
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
Phase evolution
0104 chemical sciences
chemistry.chemical_compound
chemistry
Mechanics of Materials
Silicide
Materials Chemistry
Composite material
0210 nano-technology
Subjects
Details
- ISSN :
- 09258388
- Volume :
- 788
- Database :
- OpenAIRE
- Journal :
- Journal of Alloys and Compounds
- Accession number :
- edsair.doi...........d7ac1bd392c414c03e234d57aa507ea1
- Full Text :
- https://doi.org/10.1016/j.jallcom.2019.02.307