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The molecular composition of plasma-chemical silicon dioxide deposited onto the surface of glass microspheres, which are used in laser fusion experiments on an Iskra-5 facility, was studied by IR spectroscopy. It was found that stoichiometric silica containing organic impurities was deposited on substrates regardless of the glow-discharge working gas composition. The microphotographs of the surface of films deposited in various gas discharge atmospheres were obtained using a JCMA-733 instrument. All films were amorphous, as found by X-ray diffraction analysis.