Novel beamline optics for x-ray lithography

We describe here a unique lithography beamline that delivers x-rays using a flexible arrangement of two toroidal mirrors (one concave-concave and the other concave-convex), providing high spectral and spatial uniformity at the wafer plane. The image produced is a thin horizontal line, suitable for exposing a 25 by 50 mm field compatible with 0.25 μm VLSI. We also present the current status of the beamline being constructed at CXrl utilizing these optics.