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Environments Adaptability and Failure Analysis of Nanoscale Vacuum Channel Transistors
- Source :
- 2020 IEEE 21st International Conference on Vacuum Electronics (IVEC).
- Publication Year :
- 2020
- Publisher :
- IEEE, 2020.
-
Abstract
- Metal-emitter-based nanoscale vacuum channel transistors with vertical surround-gate configuration were fabricated by using thin-film deposition and focus ion beam etching. Adaptability testing in different vacuum environments and failure analysis of the transistors were carried out to make the basis for stability enhancement and component performance improvement.
- Subjects :
- Materials science
business.industry
media_common.quotation_subject
Transistor
Adaptability
law.invention
Computer Science::Hardware Architecture
Computer Science::Emerging Technologies
law
Etching (microfabrication)
Optoelectronics
Deposition (phase transition)
Ion beam etching
Performance improvement
business
Nanoscopic scale
Communication channel
media_common
Subjects
Details
- Database :
- OpenAIRE
- Journal :
- 2020 IEEE 21st International Conference on Vacuum Electronics (IVEC)
- Accession number :
- edsair.doi...........d58c1de5f5327408eb3228d16de09c36
- Full Text :
- https://doi.org/10.1109/ivec45766.2020.9520635