Polishing damages to electrical properties of BLT thin-film capacitors fabricated by damascene process

Authors :: S.-h. Shin
H.-y. Lee
P.-g. Jung
Jang-Yeol Kim
Nam-Hoon Kim
W.-S. Lee
Source :: Electronics Letters. 44:1429
Publication Year :: 2008
Publisher :: Institution of Engineering and Technology (IET), 2008.
Abstract: Polishing pressure in the damascene process for BLT thin films improves the removal rate and surface roughness; however, the electrical properties of BLT capacitors fabricated by the damascene process with high pressure worsened. Therefore, low pressure was suitable for BLT capacitors fabricated by the damascene process when considering the electrical properties.

Subjects :: Capacitor
Materials science
law
High pressure
Copper interconnect
Surface roughness
Forensic engineering
Polishing
Surface finish
Electrical and Electronic Engineering
Thin film
Composite material
law.invention

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