Back to Search
Start Over
Influence of oxidation and carbon-containing contamination in the stabilization of the luminescence in porous silicon
- Source :
- Thin Solid Films. 354:34-37
- Publication Year :
- 1999
- Publisher :
- Elsevier BV, 1999.
-
Abstract
- This paper is focused to the study of the stabilization of the photoluminescent properties of porous silicon (PS). For this purpose, as-formed PS samples were subjected to different surface treatments. Photoluminescent excitation spectra were used to obtain the indirect band gaps, yielding practically the same values for PS films having undergone different surface annealing and post-etch treatments. However, the excitation spectra show a significant blueshift with aging for the different samples, which has been related to the initial amount of oxygen present in the porous surface as detected by XPS and FTIR. The variation of the intensity of the excitation spectra with aging has also been studied and can be associated to carbon contamination. The results are interpreted in terms of quantum size effects in PS and the influence of the surface composition.
- Subjects :
- Materials science
Photoluminescence
Silicon
Band gap
Annealing (metallurgy)
technology, industry, and agriculture
Metals and Alloys
Analytical chemistry
chemistry.chemical_element
Surfaces and Interfaces
Porous silicon
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Blueshift
chemistry
X-ray photoelectron spectroscopy
Materials Chemistry
Luminescence
Subjects
Details
- ISSN :
- 00406090
- Volume :
- 354
- Database :
- OpenAIRE
- Journal :
- Thin Solid Films
- Accession number :
- edsair.doi...........d53f2da526ecf0ec8655cd1ad47de670
- Full Text :
- https://doi.org/10.1016/s0040-6090(99)00576-3