Conformal thin-film silicon nitride deposited by hot-wire chemical vapor deposition

Authors :: Scott Ward
Shulin Wang
Errol Antonio C. Sanchez
Brian Keyes
Lynn Gedvilas
Qi Wang
Source :: Applied Physics Letters. 84:338-340
Publication Year :: 2004
Publisher :: AIP Publishing, 2004.
Abstract: We have studied silicon nitride thin films deposited by hot-wire chemical vapor deposition as a function of the substrate temperature and hydrogen dilution. We found that adding H2 to the process significantly enhances silicon nitride film deposition. High-quality films can be grown at low substrate temperatures (

Subjects :: Materials science
Physics and Astronomy (miscellaneous)
Analytical chemistry
Nanocrystalline silicon
Combustion chemical vapor deposition
Pulsed laser deposition
chemistry.chemical_compound
Carbon film
Chemical engineering
Silicon nitride
chemistry
Plasma-enhanced chemical vapor deposition
Physical vapor deposition
Thin film

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