Room-Temperature Atomic Layer Deposition of SnO2 Using Tetramethyltin and Its Application to TFT Fabrication

Authors :: Bashir Ahmmad
Shunsuke Saito
Shigeru Kubota
Kentaro Tokoro
Kensaku Kanomata
Masanori Miura
Fumihiko Hirose
Source :: IEICE Transactions on Electronics. :317-322
Publication Year :: 2018
Publisher :: Institute of Electronics, Information and Communications Engineers (IEICE), 2018.

Subjects :: 010302 applied physics
Fabrication
Materials science
business.industry
Tetramethyltin
02 engineering and technology
021001 nanoscience & nanotechnology
01 natural sciences
Electronic, Optical and Magnetic Materials
chemistry.chemical_compound
Atomic layer deposition
chemistry
Thin-film transistor
0103 physical sciences
Optoelectronics
Electrical and Electronic Engineering
0210 nano-technology
business

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