Characterization of the manufacturability of ultrathin resist

MLA

Christopher Lee Pike, et al. “Characterization of the Manufacturability of Ultrathin Resist.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, Jan. 1999, p. 3039. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........d1f9c689a66c36030981734fe7b85851&authtype=sso&custid=ns315887.

APA

Christopher Lee Pike, Khanh B. Nguyen, Jeff A. Schefske, Chris Lyons, Harry J. Levinson, Uzodinma Okoroanyanwu, Scott C. Bell, Paul T. King, & Khoi A. Phan. (1999). Characterization of the manufacturability of ultrathin resist. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 17, 3039.

Chicago

Christopher Lee Pike, Khanh B. Nguyen, Jeff A. Schefske, Chris Lyons, Harry J. Levinson, Uzodinma Okoroanyanwu, Scott C. Bell, Paul T. King, and Khoi A. Phan. 1999. “Characterization of the Manufacturability of Ultrathin Resist.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 17 (January): 3039. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........d1f9c689a66c36030981734fe7b85851&authtype=sso&custid=ns315887.