Effect of deposition temperature on the structural and surface properties of AlN by plasma enhanced atomic layer deposition

Authors :: 陈芳 Chen Fang
方铉 Fang Xuan
王双鹏 Wang Shuangpeng
牛守柱 Niu Shouzhu
方芳 Fang Fang
房丹 Fang Dan
唐吉龙 Tang Jilong
王晓华 Wang Xiaohua
刘国军 Liu Guojun
魏志鹏 Wei Zhipeng
Source :: Infrared and Laser Engineering. 45:0421001
Publication Year :: 2016
Publisher :: Shanghai Institute of Optics and Fine Mechanics, 2016.

Subjects :: Space and Planetary Science
Aerospace Engineering
Electrical and Electronic Engineering
Atomic and Molecular Physics, and Optics

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