Back to Search Start Over

Doped In-Ge-Te Phase Change Memory Featuring Stable Operation and Good Data Retention

Authors :
Masahiro Moniwa
Nozomu Matsuzaki
Norikatsu Takaura
Satoru Hanzawa
Y. Fuiisaki
Takahiro Morikawa
Yuichi Matsui
Motoyasu Terao
H. Moriya
Tomio Iwasaki
Masamichi Matsuoka
Tsuyoshi Koga
Akira Kotabe
Kenzo Kurotsuchi
M. Kinoshita
F. Nitta
Source :
2007 IEEE International Electron Devices Meeting.
Publication Year :
2007
Publisher :
IEEE, 2007.

Abstract

We have fabricated a phase change memory using doped In-Ge-Te to improve the data retention required for industrial and automotive use. This chalcogenide features higher thermal stability as well as denser texture and improved adhesion. The memory cell using doped In-Ge-Te provided a larger read margin and better data retention than conventional Ge2Sb2Tes, and we demonstrated 10-year retention at temperatures above 150degC, which is the highest temperature ever reported.

Details

Database :
OpenAIRE
Journal :
2007 IEEE International Electron Devices Meeting
Accession number :
edsair.doi...........cfc8c2cfd98d99a1a932eec972b16894
Full Text :
https://doi.org/10.1109/iedm.2007.4418932