Titanium di-oxide films using a less hygroscopic colloidal precursor

We report the study of titanium dioxide films (TiO 2 ) using titanium di-isopropoxyl di-2ethyl hexanoate Ti(OC 3 H 7 ) 2 (C 7 H 15 COO) 2 colloidal precursor. This compound is less hygroscopic in nature and easy to use with processes like spin or dip coating. Thin films of TiO 2 are made on silicon substrates and their structural and optical properties are studied. The effect of Ti content in the precursor, sintering temperature and its duration on film thickness and refractive index are investigated. Refractive index shows an increasing trend with the rise in the sintering temperature but remains unchanged with the time. The film thickness decreases with both sintering temperature and time and increases with Ti content in the precursor. Reflectivity measurements show marked reduction in the reflection losses compared to bare silicon surface wherein the film thickness is altered by spin speed. XRD results show anatase phase in the samples sintered at lower temperature (