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On the Physical Mechanism of Negative Capacitance Effect in Ferroelectric FET

Authors :
Masaharu Kobayashi
Source :
2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
Publication Year :
2020
Publisher :
IEEE, 2020.

Abstract

Negative capacitance FET is a promising CMOS technology booster which may break the limit of 60mV/dec in subthreshold swing (SS) without degrading performance. We investigated the physical mechanism of negative capacitance in ferroelectric FET (FeFET) by considering the dynamics of the polarization in ferroelectric gate insulator: transient negative capacitance (TNC). Polarization switching and depolarization effect are essential to cause negative capacitance effect, that is, apparent surface potential amplification in deep subthreshold region with small depletion layer capacitance. Moreover, unique features of reverse DIBL and negative differential resistance (NDR) are also reproduced by the transient negative capacitance theory. Modeling charged defect in FeFET, hysteresis-free sub-60mV/dec SS can be realized. TNC theory is regarded as a comprehensive framework to model subthreshold characteristics of FeFET.

Details

Database :
OpenAIRE
Journal :
2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
Accession number :
edsair.doi...........cf7924d09dffecf5d50ff0227b1b4cd6
Full Text :
https://doi.org/10.23919/sispad49475.2020.9241628