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COMPOSITE -- A Complete Modeling Program of Silicon Technology

Authors :
Jurgen Lorenz
Heiner Ryssel
J. Pelka
A. Sachs
M. Svoboda
A. Seidl
Source :
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 4:421-430
Publication Year :
1985
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 1985.

Abstract

A new two-dimensional process modeling program written in Fortran is described. For the first time, this program allows the simulation of all important processing steps occurring in typical sequences involved in the fabrication of integrated circuits such as doping, oxidation, lithography, etching, and layer deposition. The program possesses a modular structure to allow for easy changing and improvement of process models as well as of mathematical procedures. The program is menu driven to make it easy to use for non-experts and it is readily usable with different computer systems.

Details

ISSN :
19374151 and 02780070
Volume :
4
Database :
OpenAIRE
Journal :
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Accession number :
edsair.doi...........cf52fb1c81ac94c09c1f370aaf058494