Laser-induced surface structuring for electron cloud mitigation in particle accelerators

Pulsed laser processing of vacuum component surfaces is a promising method for electron cloud mitigation in particle accelerators. By generating a hierarchically structured surface, the escape probability of secondary electrons is reduced. The choice of laser treatment parameters ��� such as laser power, scanning speed and line distance ��� has an influence on the resulting surface morphology as well as on its performance. The impact of processing parameters on the surface properties of copper is investigated by Secondary Electron Yield (SEY) measurements, Scanning Electron Microscopy (SEM), ablation depth measurements in an optical microscope and particle release analysis. Independent of the laser wavelength (532nm and 1064nm), it was found that the surface morphology changes when varying the processing parameters. The ablation depth increases and the SEY reduces with increasing laser fluence. The final application requires the capability to treat tens of meters of vacuum pipes. The limiting factors of this type of surface treatment for the applicability in particle accelerators are discussed.