Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films

Electron-beam lithography is used to pattern either cationic polyvinyl N-methyl pyridine or anionic sulfonated polystyrene polymers, that act as negative resists, to produce templates for electroless deposition and the electrostatic assembly of metallic, magnetic, or semiconductor nanoparticles.